Chemijos terminų aiškinamasis žodynas – 2-asis patais. ir papild. leid. – Vilnius: Mokslo ir enciklopedijų leidybos institutas. Kazys Daukšas, Jurgis Barkauskas, Vitas Daukšas. 2003.
aluminium plating — aliuminiavimas statusas T sritis chemija apibrėžtis Paviršiaus dengimas aliuminiu. atitikmenys: angl. aluminium deposition; aluminium plating; aluminizing rus. алюминирование … Chemijos terminų aiškinamasis žodynas
Aluminium — Infobox aluminiumAluminium (Audio IPA|En uk aluminium1.ogg|ˌæljʊˈmɪniəm, IPA|/ˌæljəˈmɪniəm/) or aluminum (Audio IPA|En uk aluminum.ogg|/əˈluːmɪnəm/, see spelling below) is a silvery white and ductile member of the boron group of chemical elements … Wikipedia
Aluminium — Eigenschaften … Deutsch Wikipedia
Aluminium hydride — Chembox new ImageFile = ImageSize = IUPACName = aluminium trihydride alumane trihydridoaluminium OtherNames = Aluminium(III) hydride; alane; aluminum hydride, α alane Section1 = Chembox Identifiers CASNo = 7784 21 6 PubChem = SMILES = Section2 =… … Wikipedia
Déposition sous vide — Dépôt sous vide Sommaire 1 But 2 Principe 3 Contraintes particulières 4 Avantages et inconvénients … Wikipédia en Français
Isotopes of aluminium — Aluminium (Al) has multiple isotopes. Only 27Al (stable isotope) and 26Al (radioactive isotope, t 1/2 = 7.2 × 105 y) occur naturally, however 27Al has a natural abundance of 99.9+ %. Standard atomic mass is 26.9815386(8) u. 26Al is produced from… … Wikipedia
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
Evaporation (deposition) — Evaporation machine used for metallization at LAAS technological facility in Toulouse, France. Evaporation is a common method of thin film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel… … Wikipedia
Cathodic arc deposition — or Arc PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique is can be used to deposit a… … Wikipedia
